Spatial batch optimal design based on self-learning gaussian process models for LPCVD processes

Pei Sun; Lei Xie; Junghui Chen

doi:10.1016/j.cjche.2015.11.013

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Spatial batch optimal design based on self-learning gaussian process models for LPCVD processes

第25届中国过程控制会议专栏 | Updated：2026-01-06

- Spatial batch optimal design based on self-learning gaussian process models for LPCVD processes
- Spatial batch optimal design based on self-learning gaussian process models for LPCVD processes
- 中国化学工程学报（英文版） 2015年23卷第12期页码：1958-1964
- Affiliations：
  
  State Laboratory of Industrial Control Technology, Institute of Cyber-Systems and Control, Zhejiang University,Hangzhou,China,310027
- Author bio：
- Funds：
- DOI：10.1016/j.cjche.2015.11.013
  中图分类号：
- 纸质出版：2015
- Accepted：
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Pei Sun, Lei Xie, Junghui Chen. Spatial batch optimal design based on self-learning gaussian process models for LPCVD processes[J]. 中国化学工程学报（英文版）, 2015,23(12):1958-1964.

Pei Sun, Lei Xie, Junghui Chen. Spatial batch optimal design based on self-learning gaussian process models for LPCVD processes[J]. Chin.J.Chem.Eng., 2015, 23(12): 1958-1964.
Pei Sun, Lei Xie, Junghui Chen. Spatial batch optimal design based on self-learning gaussian process models for LPCVD processes[J]. 中国化学工程学报（英文版）, 2015,23(12):1958-1964. DOI： 10.1016/j.cjche.2015.11.013.

Pei Sun, Lei Xie, Junghui Chen. Spatial batch optimal design based on self-learning gaussian process models for LPCVD processes[J]. Chin.J.Chem.Eng., 2015, 23(12): 1958-1964. DOI： 10.1016/j.cjche.2015.11.013.

摘要

Abstract

Low pressure chemical vapor deposition (LPCVD) is one of themost important processes during semiconductor manufacturing. However

the spatial distribution of internal temperature and extremely few samples makes it hard to build a good-quality model of this batch process. Besides

due to the properties of this process

the reliability of the model must be taken into consideration when optimizing the MVs. In this work

an optimal design strategy based on the self-learning Gaussian processmodel (GPM)is proposed to control this kind of spatial batch process. The GPMis utilized as the internalmodel to predict the thicknesses of thin films on all spatial-distributed wafers using the limited data. Unlike the conventional model based design

the uncertainties of predictions provided by GPM are taken into consideration to guide the optimal design of manipulated variables so that the designing can be more prudent. Besides

the GPM is also actively enhanced using as little data as possible based on the predictive uncertainties. The effectiveness of the proposed strategy is successfully demonstrated in an LPCVD process.

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