孙帅帅, 黄国强. Simulation of Reactive Distillation Process for Monosilane Production via Redistribution of Trichlorosilane[J]. 中国化学工程学报(英文版), 2014,22(3):287-2931004-954160045-8.
Redistribution of Trichlorosilane[J]. Chinese Journal of Chemical Engineering, 2014, 22(3): 287-293.
孙帅帅, 黄国强. Simulation of Reactive Distillation Process for Monosilane Production via Redistribution of Trichlorosilane[J]. 中国化学工程学报(英文版), 2014,22(3):287-2931004-954160045-8.DOI: 10.1016/S1004-9541(14)60045-8.
Redistribution of Trichlorosilane[J]. Chinese Journal of Chemical Engineering, 2014, 22(3): 287-293.DOI: 10.1016/S1004-9541(14)60045-8.
Simulation of Reactive Distillation Process for Monosilane Production via Redistribution of Trichlorosilane
The reactive distillation process for producing high purity monosilane via trichlorosilane redistribution reaction was simulated. Rigorous RadFrac block was employed in Aspen Plus simulation package. Accurate results could be given when the chemical kinetics was taken into account in the equilibrium stage model. A single column process was used for the verification of previous studies. The results showed that 99.9% purity monosilane could be achieved in the reactive distillation. A pumparound block was employed to reduce the condenser duty with inexpensive coolant. The effects of operating pressure
feed stage location
liquid holdup per stage and pumparound location were also investigated. The energy consumption was limited
but the refrigerant temperature was too low
which is the fatal disadvantage. Therefore
a double columns process was developed to increase the condenser temperature. The simulation results demonstrated that a reasonable temperature could be achieved by varying the recycle stream location.
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