Uniform deposition of ultra-thin TiO<sub>2</sub> film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Ming Liu; Ying Li; Rui Wang; Guoqiang Shao; Pengpeng Lv; Jun Li; Qingshan Zhu

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Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Full Length Article | Updated：2026-01-06

- Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration
- Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration
- 中国化学工程学报（英文版） 2023年60卷第8期页码：99-107
- Affiliations：
  
  1. State Key Laboratory of Multiphase Complex Systems, Institute of Process Engineering, Chinese Academy of Sciences,Beijing,China,100190
  2. School of Chemical & Environmental Engineering, China University of Mining and Technology-, Beijing,Beijing,China,100083
  3. School of Chemical Engineering, University of Chinese Academy of Sciences,Beijing,China,100049
- Author bio：
- Funds：
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  中图分类号：
- 纸质出版：2023
- Accepted：
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Ming Liu, Ying Li, Rui Wang, 等. Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration[J]. 中国化学工程学报（英文版）, 2023,60(8):99-107.

film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration[J]. 中国化学工程学报, 2023, 60(8): 99-107.
Ming Liu, Ying Li, Rui Wang, 等. Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration[J]. 中国化学工程学报（英文版）, 2023,60(8):99-107. DOI：

film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration[J]. 中国化学工程学报, 2023, 60(8): 99-107. DOI：

摘要

Abstract

The performance of pearlescent pigment significantly affected by the grain size and the roughness of deposited film. The effect of TiCl

concentration on the initial deposition of TiO

on mica by atmospheric pressure chemical vapor deposition (APCVD) was investigated. The precursor concentration significantly affected the deposition and morphology of TiO

grains assembling the film. The deposition time for fully covering the surface of mica decreased from 120 to 10 s as the TiCl

concentration increased from 0.38% to 2.44%. The grain size increased with the TiCl

concentration. The AFM and TEM analysis demonstrated that the aggregation of TiO

clusters at the initial stage finally result to the agglomeration of fine TiO

grains at high TiCl

concentrations. Following the results

it was suggested that the nucleation density and size was easy to be adjusted when the TiCl

concentration is below 0.90%.

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Uniform deposition of ultra-thin TiO2 film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Uniform deposition of ultra-thin TiO2 film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

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摘要

Abstract

关键词

Keywords

references

Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration

Uniform deposition of ultra-thin TiO₂ film on mica substrate by atmospheric pressure chemical vapor deposition: Effect of precursor concentration