Integrated UV-based photo microreactor-distillation technology toward process intensification of continuous ultra-high-purity electronic-grade silicon tetrachloride manufacture

Ye Wan; Wenhui Guo; Jin Xiao; Dazhou Yan; Xiong Zhao; Shuhu Guo; Jianhua Liu; Qifan Zhong; Tao Yang; Yu Zhao; Xin Chang; Xin Gao

doi:10.1016/j.cjche.2020.06.023

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Integrated UV-based photo microreactor-distillation technology toward process intensification of continuous ultra-high-purity electronic-grade silicon tetrachloride manufacture

Separation Science and Engineering | Updated：2026-01-06

- Integrated UV-based photo microreactor-distillation technology toward process intensification of continuous ultra-high-purity electronic-grade silicon tetrachloride manufacture
- Chinese Journal of Chemical Engineering Vol. 28, Issue 9, Pages: 2248-2255(2020)
- Affiliations：
  
  1. School of Metallurgy and Environment, Central South University,Changsha,China,410083
  2. China ENFI Engineering Co., Ltd.,Beijing,China,100038
  3. National Engineering Laboratory of Polysilicon Materials Preparation Technology,Luoyang,China,471023
  4. National Engineering Laboratory of Efficient Utilization of Refractory Nonferrous Metal Resources, Central South University,Changsha,China,410083
  5. School of Chemical Engineering and Technology, Tianjin University,Tianjin,China,300072
- Author bio：
- Funds：
- DOI：10.1016/j.cjche.2020.06.023
  CLC：
- Published：2020
- Accepted：
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Ye Wan, Wenhui Guo, Jin Xiao, Dazhou Yan, Xiong Zhao, Shuhu Guo, Jianhua Liu, Qifan Zhong, Tao Yang, Yu Zhao, Xin Chang, Xin Gao. Integrated UV-based photo microreactor-distillation technology toward process intensification of continuous ultra-high-purity electronic-grade silicon tetrachloride manufacture[J]. Chinese Journal of Chemical Engineering, 2020, 28(9): 2248-2255.
DOI：

Ye Wan, Wenhui Guo, Jin Xiao, Dazhou Yan, Xiong Zhao, Shuhu Guo, Jianhua Liu, Qifan Zhong, Tao Yang, Yu Zhao, Xin Chang, Xin Gao. Integrated UV-based photo microreactor-distillation technology toward process intensification of continuous ultra-high-purity electronic-grade silicon tetrachloride manufacture[J]. Chinese Journal of Chemical Engineering, 2020, 28(9): 2248-2255. DOI： 10.1016/j.cjche.2020.06.023.

摘要

Abstract

Ultra-high-purity silicon tetrachloride (SiCl

) is demanded as an electronic-grade chemical to meet the stringent requirements of the rapidly developing semiconductor industry. The high requirement for ultra-high-purity SiCl

has created the need for a high-efficient process for reducing energy consumption as well as satisfying product quality. In this paper

a mass of production technology of ultra-high-purity SiCl

was successfully developed through chlorination reaction in the ultraviolet (UV)-based photo microreactor coupled with the distillation process. The influences of key operational parameters

including temperature

pressure

UV wavelength and light intensity on the product quality

especially for hydrogen-containing impurities

were quantified by the infrared transmittance of Fourier transform infrared spectroscopy (FT-IR) at 2185 cm

-1

and 2160 cm

-1

indicating that characteristic vibrational modes of Si—H bonds

as well as the operating conditions of distillation were also investigated as key factors for metal impurities removing. The advanced inte

nsification of SiCl

manufactured by the integration of photo microreactor and distillation achieves the products with superior specifications higher than the standard commercial products.

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