Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon

李建隆; 陈光辉; 张攀; 王伟文; 段继海

doi:10.1016/S1004-9541(11)60052-9

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Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon

Updated：2026-01-06

- Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon
- Chinese Journal of Chemical Engineering Vol. 19, Issue 5, Pages: 747-753(2011)
- Affiliations：
  
  1. Institute of Chemical Engineering, Qingdao University of Science and Technology,Qingdao,China,266042
  2. Institute of Electromechanical Engineering, Qingdao University of Science and Technology,Qingdao,China,266061
- Author bio：
- Funds：
- DOI：10.1016/S1004-9541(11)60052-9
  CLC：
- Published：2011
- Accepted：
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LI Jianlong, CHEN Guanghui, ZHANG Pan, WANG Weiwen, DUAN Jihai. Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon[J]. , 2011, 19(5): 747-753.
DOI：

LI Jianlong, CHEN Guanghui, ZHANG Pan, WANG Weiwen, DUAN Jihai. Technical Challenges and Progress in Fluidized Bed Chemical Vapor Deposition of Polysilicon[J]. , 2011, 19(5): 747-753. DOI： 10.1016/S1004-9541(11)60052-9.

摘要

Abstract

Various methods for production of polysilicon have been proposed for lowering the production cost and energy consumption

and enhancing productivity

which are critical for industrial applications. The fluidized bed chemical vapor deposition (FBCVD) method is a most promising alternative to conventional ones

but the homo-geneous reaction of silane in FBCVD results in unwanted formation of fines

which will affect the product quality and output. There are some other problems

such as heating degeneration due to undesired polysilicon deposition on the walls of the reactor and the heater. This article mainly reviews the technological development on FBCVD of polycrystalline silicon and the research status for solving the above problems. It also identifies a number of chal-lenges to tackle and principles should be followed in the design of a FBCVD reactor.

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