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School of Chemistry and Chemical Engineering, Yantai University,Yantai,China,264005
Published:2024
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NF
3
is commonly used as an etching and cleaning gas in semiconductor industry
however it is a strongly greenhouse gas. Therefore
the destruction of disposal NF
is an urgent task to migrate the greenhouse effect. Among the technologies for NF
abatement
the destructive sorption of NF
over metal oxides sor bents is an effective way. Thus
the search for a highly reactive and utilized sorbent for NF
destruction is in great demand. In this work
AlOOH supported on carbon-sphere (AlOOH/CS) as precursors were syn thesized hydrothermally and heat-treated to prepare the Al
2
sorbents. The influence of AlOOH/CS hydrothermal temperatures on the reactivity of derived Al
sorbents for NF
destruction was investi gated
and it is shown that the Al
from AlOOH/CS hydro-thermalized at 120℃ is superior to others. Subsequently
the optimized Al
was covered by Mn(OH)
x
to prepare Mn/Al
sorbents
via
changing hydrothermal temperatures and Mn loadings. The results show that the Mn/Al
sorbents are more uti lized than bare Al
in NF
destructive sorption due to the promotional effect of Mn
as surface layer on the fluorination of Al
as substrate
especially the optimal 5%Mn/Al
(160 ℃) exhibits a utilization percentage as high as 90.4%
and remarkably exceeds all the sorbents reported so far. These findings are beneficial to develop more efficient sorbents for the destruction of NF
.
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